KLA Corporation, a leading provider of process control and yield management solutions, partners with customers around the world to develop state-of-the-art inspection and metrology technologies. These technologies serve the semiconductor, data storage, LED, and other related nanoelectronics industries. With a portfolio of industry-standard products and a team of world-class engineers and scientists, the company has created superior solutions for its customers for more than 35 years. Headquartered in Milpitas, Calif., KLA has dedicated customer operations and service centers around the world. Additional information may be found at www.kla-tencor.com.
The Film and Scatterometry Technology (FaST) Division provides industry leading metrology solutions for worldwide semiconductor IC manufacturers. The FaST Division portfolio of metrology products includes hardware and software solutions for optical film thickness, optical critical dimension (CD), composition, and resistivity measurement systems. These products are essential for the IC manufacturers as they provide critical metrology capabilities for the development and implementation of their advanced IC processes. The FaST division is committed to support our customers to achieve performance entitlement of our solution and we effectively partner with our customers from their early research and development phase to the high volume in-line manufacturing implementation specific for their process needs. The division consists of a global team located in US, Israel, China, and India.
The mission of Advanced Development group is to propose and demonstrate next-generation differentiated technologies for semiconductor device and thin film metrology.
The Research Scientist will work in the FaST division developing next generation laser produced light sources for our semiconductor metrology research and development. The FaST division is the leading supplier of optical film thickness and composition metrology and scatterometry profile metrology used by major semiconductor manufacturers. The candidate will be responsible for designing, developing, testing and implementing high brightness X-ray and plasma light sources to support KLA's roadmap in wafer metrology. The candidate will work within the FaST Advanced Development group and will be interacting with the technology and engineering teams to develop promising new concepts, methods and subsystems that will be used to meet these challenges.
This role will involve requirements analysis, systems design and testing of complex metrology systems using expertise from multiple technical disciplines. The selected candidate will:
Equal Employment Opportunity
KLA is an Equal Opportunity Employer. Applicants will be considered for employment without regard to age, race, color, religion, sex, sexual orientation, gender identity, national origin, protected veteran status, disability, or any other characteristics protected by applicable law.