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Calling the adventurers ready to join a company that's pushing the limits of nanotechnology to keep the digital revolution rolling. At KLA, we're making technology advancements that are bigger—and tinier—than the world has ever seen.
Who are we? We research, develop, and manufacture the world's most advanced inspection and measurement equipment for the semiconductor and nanoelectronics industries. We enable the digital age by pushing the boundaries of technology, creating tools capable of finding defects smaller than a wavelength of visible light. We create smarter processes so that technology leaders can manufacture high-performance chips—the kind in that phone in your pocket, the tablet on your desk and nearly every electronic device you own—faster and better. We're passionate about creating solutions that drive progress and help people do what wouldn't be possible without us. The future is calling. Will you answer?
Work on process control for edge placement error (EPE), an expansion of CD uniformity (CDU) and overlay control, to account for the more complex interactions in leading-edge multi-patterning and process integration schemes. Work on a team to develop statistics-based analysis techniques for data streams from KLA's metrology tools, such as the Archer (overlay), SpectraShape (CD), and PWG (wafer shape) tools. Develop physics-based models that are related to the physical processes used in semiconductor manufacturing, in order to combine measurements in a meaningful way. Analyze how wafer bending modes due to film stress can induce overlay errors. Combine models with feed-forward and feed-back control methods. Analyze these process control loops for stability and effectiveness in reducing manufacturing errors.
Employer will accept a PhD in Physics, Applied Math, Engineering, or a related field.
WORK LOCATION: Milpitas, CA.
Equal Employment Opportunity
KLA is an Equal Opportunity Employer. Applicants will be considered for employment without regard to age, race, color, religion, sex, sexual orientation, gender identity, national origin, protected veteran status, disability, or any other characteristics protected by applicable law.