Calling the adventurers ready to join a company that's pushing the limits of nanotechnology to keep the digital revolution rolling. At KLA-Tencor, we're making technology advancements that are bigger—and tinier—than the world has ever seen.
Who are we? We research, develop, and manufacture the world's most advanced inspection and measurement equipment for the semiconductor and nanoelectronics industries. We enable the digital age by pushing the boundaries of technology, creating tools capable of finding defects smaller than a wavelength of visible light. We create smarter processes so that technology leaders can manufacture high-performance chips—the kind in that phone in your pocket, the tablet on your desk and nearly every electronic device you own—faster and better. We're passionate about creating solutions that drive progress and help people do what wouldn't be possible without us. The future is calling. Will you answer?
The RAPID division is the world leading provider of reticle inspection solutions for the semiconductor industry. The company provides inspection solutions to both the mask shops and the semiconductor fabs to ensure that lithography yields are consistently high thus enabling cost-effective manufacturing.
KLA-Tencor is seeking a talented individual for a senior software engineering position in the Data Management and Computation (DMC) group within the reticle and photomask inspection division (RAPID). The successful candidate will contribute to the hardware and software implementation for the division’s next-generation image computer. He/she will also provide support for various legacy data preparation systems and software. The ideal candidate should be able to assist meaningfully with the design and implementation of new Linux hardware+software platforms, as well as assuming maintenance of a large, mature C++/Java code base.
Equal Employment Opportunity
KLA-Tencor is an Equal Opportunity Employer. Applicants will be considered for employment without regard to race, color, religion, sex, sexual orientation, gender identity, national origin, protected veteran status, disability, or any other characteristics protected by applicable law.